Publications
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Photocatalytic activity of TiO2 deposited by reactive HiPIMS with long target-to-substrate distance
Part of Surface & Coatings Technology, 2023.
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Atomic Layer Deposition of SnO2 as an Electron Transport Material for Solid-State P-type Dye-Sensitized Solar Cells
Part of ACS Applied Energy Materials, p. 12022-12028, 2022.
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Wide-Gap Chalcopyrite Solar Cells with Indium Oxide-Based Transparent Back Contacts
Part of Solar RRL, 2022.
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High Performance Full-Inorganic Flexible Memristor with Combined Resistance-Switching
Part of ACS Applied Materials and Interfaces, p. 21173-21180, 2022.
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Synthesis of BaZrS3 Perovskite Thin Films at a Moderate Temperature on Conductive Substrates
Part of ACS Applied Energy Materials, p. 6335-6343, 2022.
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Self-Limited Formation of Bowl-Shaped Nanopores for Directional DNA Translocation
Part of ACS Nano, p. 17938-17946, 2021.
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On the description of metal ion return in reactive high power impulse magnetron sputtering
Part of Surface & Coatings Technology, 2021.
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Superconducting V3Si for quantum circuit applications
Part of Microelectronic Engineering, 2021.
DOI for Superconducting V3Si for quantum circuit applications
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Substrate Effects on Crystal Phase in Atomic Layer Deposition of Tin Monosulfide
Part of Chemistry of Materials, p. 2901-2912, 2021.
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Correlation between Substrate Ion Fluxes and the Properties of Diamond-Like Carbon Films Deposited by Deep Oscillation Magnetron Sputtering in Ar and Ar plus Ne Plasmas
Part of Coatings, 2020.
DOI for Correlation between Substrate Ion Fluxes and the Properties of Diamond-Like Carbon Films Deposited by Deep Oscillation Magnetron Sputtering in Ar and Ar plus Ne Plasmas Download full text (pdf) of Correlation between Substrate Ion Fluxes and the Properties of Diamond-Like Carbon Films Deposited by Deep Oscillation Magnetron Sputtering in Ar and Ar plus Ne Plasmas
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High power impulse magnetron sputtering of diamond-like carbon coatings
Part of Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, 2020.
DOI for High power impulse magnetron sputtering of diamond-like carbon coatings
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Tailoring residual stresses in CrNx films on alumina and silicon deposited by high-power impulse magnetron sputtering
Part of Surface & Coatings Technology, 2020.
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Chalcogenide Perovskite BaZrS3: Thin Film Growth by Sputtering and Rapid Thermal Processing
Part of ACS Applied Energy Materials, p. 2762-2770, 2020.
DOI for Chalcogenide Perovskite BaZrS3: Thin Film Growth by Sputtering and Rapid Thermal Processing Download full text (pdf) of Chalcogenide Perovskite BaZrS3: Thin Film Growth by Sputtering and Rapid Thermal Processing
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A Strategy for Alleviating Micro Arcing during HiPIMS Deposition of DLC Coatings
Part of Materials, 2020.
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Reactive high power impulse magnetron sputtering
Part of High Power Impulse Magnetron Sputtering, p. 223-263, 2020.
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Room Temperature Reactive Deposition of InGaZnO and ZnSnO Amorphous Oxide Semiconductors for Flexible Electronics
Part of Coatings, 2020.
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Back and front contacts in kesterite solar cells: state-of-the-art and open questions
Part of Journal of Physics, 2019.
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Antimony-Doped Tin Oxide as Transparent Back Contact in Cu2ZnSnS4 Thin-Film Solar Cells
Part of Physica Status Solidi (a) applications and materials science, 2019.
DOI for Antimony-Doped Tin Oxide as Transparent Back Contact in Cu2ZnSnS4 Thin-Film Solar Cells Download full text (pdf) of Antimony-Doped Tin Oxide as Transparent Back Contact in Cu2ZnSnS4 Thin-Film Solar Cells
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Mechanistic Insights into Solid-State p-Type Dye-Sensitized Solar Cells
Part of The Journal of Physical Chemistry C, p. 26151-26160, 2019.
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Hydrogen site location in ultrathin vanadium layers by N-15 nuclear reaction analysis
Part of Nuclear Instruments and Methods in Physics Research Section B, p. 57-60, 2019.
DOI for Hydrogen site location in ultrathin vanadium layers by N-15 nuclear reaction analysis
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Metal Filling by High Power Impulse Magnetron Sputtering
Part of Journal of Physics D, 2019.
DOI for Metal Filling by High Power Impulse Magnetron Sputtering
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Mechanical Properties of Hydrogen Free Diamond-Like Carbon Thin Films Deposited by High Power Impulse Magnetron Sputtering with Ne
Part of Coatings, 2018.
DOI for Mechanical Properties of Hydrogen Free Diamond-Like Carbon Thin Films Deposited by High Power Impulse Magnetron Sputtering with Ne Download full text (pdf) of Mechanical Properties of Hydrogen Free Diamond-Like Carbon Thin Films Deposited by High Power Impulse Magnetron Sputtering with Ne
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Bifacial Cu(In,Ga)Se2 solar cells using hydrogen‐doped In2O3 films as a transparent back contact
Part of Progress in Photovoltaics, p. 846-858, 2018.
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Using hydrogen‐doped In2O3 films as a transparent back contact in (Ag,Cu)(In,Ga)Se2 solar cells
Part of Progress in Photovoltaics, p. 159-170, 2018.
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Discharge runaway in high power impulse magnetron sputtering of carbon: the effect of gas pressure, composition and target peak voltage
Part of Journal of Physics D, 2018.
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Solid state p-type dye sensitized NiO-dye-TiO2 core-shell solar cells
Part of Chemical Communications, p. 3739-3742, 2018.
DOI for Solid state p-type dye sensitized NiO-dye-TiO2 core-shell solar cells
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Hard and dense diamond like carbon coatings deposited by deep oscillations magnetron sputtering
Part of Surface & Coatings Technology, p. 92-98, 2018.
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Improving the morphological stability of nickel germanide by tantalum and tungsten additions
Part of Applied Physics Letters, 2018.
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Highly conductive ultrathin Co films by high-power impulse magnetron sputtering
Part of Applied Physics Letters, 2018.
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Ultrafast dye regeneration in a core-shell NiO-dye-TiO2 mesoporous film
Part of Physical Chemistry, Chemical Physics - PCCP, p. 36-40, 2018.
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Effect of KF absorber treatment on the functionality of different transparent conductive oxide layers in CIGSe solar cells
Part of Progress in Photovoltaics, p. 13-23, 2018.
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Electronic energy-loss mechanisms for H, He, and Ne in TiN
Part of Physical Review A: covering atomic, molecular, and optical physics and quantum information, 2017.
DOI for Electronic energy-loss mechanisms for H, He, and Ne in TiN
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Ion induced stress relaxation in dense sputter-deposited DLC thin films
Part of Applied Physics Letters, 2017.
DOI for Ion induced stress relaxation in dense sputter-deposited DLC thin films
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Formation of nickel germanides from Ni layers with thickness below 10 nm
Part of Journal of Vacuum Science & Technology B, 2017.
DOI for Formation of nickel germanides from Ni layers with thickness below 10 nm
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Evolution of sputtering target surface composition in reactive high power impulse magnetron sputtering
Part of Journal of Applied Physics, 2017.
DOI for Evolution of sputtering target surface composition in reactive high power impulse magnetron sputtering Download full text (pdf) of Evolution of sputtering target surface composition in reactive high power impulse magnetron sputtering
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Minimizing sputter-induced damage during deposition of WS2 onto graphene
Part of Applied Physics Letters, 2017.
DOI for Minimizing sputter-induced damage during deposition of WS2 onto graphene Download full text 1 (pdf) of Minimizing sputter-induced damage during deposition of WS2 onto graphene Download full text 2 (pdf) of Minimizing sputter-induced damage during deposition of WS2 onto graphene
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Synthesis of hydrogenated diamondlike carbon thin films using neon-acetylene based high power impulse magnetron sputtering discharges
Part of Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, 2016.
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Massive Ta diffusion observed in Cu thin films but not in Ag counterparts
Part of Journal of Vacuum Science & Technology B, 2016.
DOI for Massive Ta diffusion observed in Cu thin films but not in Ag counterparts
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Direct comparison of atomic layer deposition and sputtering of In2O3:H used as transparent conductive oxide layer in CuIn1-xGaxSe2 thin film solar cells
Part of Solar Energy Materials and Solar Cells, p. 757-764, 2016.
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Broadband Optical Absorption Caused by the Plasmonic Response of Coalesced Au Nanoparticles Embedded in a TiO2 Matrix
Part of The Journal of Physical Chemistry C, p. 16931-16945, 2016.
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Toward synthesis of oxide films on graphene with sputtering based processes
Part of Journal of Vacuum Science & Technology B, 2016.
DOI for Toward synthesis of oxide films on graphene with sputtering based processes
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E-MRS 2015 Symposium EE: Protective coatings and thin films Preface
Part of Surface & Coatings Technology, p. 1-1, 2016.
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Hard and elastic epitaxial ZrB2 thin films on Al2O3(0001) substrates deposited by magnetron sputtering from a ZrB2 compound target
Part of Acta Materialia, p. 166-172, 2016.
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Low-temperature synthesis of thermochromic vanadium dioxide thin films by reactive high power impulse magnetron sputtering
Part of Solar Energy Materials and Solar Cells, p. 137-144, 2016.
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Architectured columns with a metal-dielectric periodic nanostructure
Part of Materials letters (General ed.), p. 128-131, 2016.
DOI for Architectured columns with a metal-dielectric periodic nanostructure
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Combinatorial magnetron sputtering of AgFeO2 thin films with the delafossite structure
Part of Materials & design, p. 132-142, 2016.
DOI for Combinatorial magnetron sputtering of AgFeO2 thin films with the delafossite structure Download full text (pdf) of Combinatorial magnetron sputtering of AgFeO2 thin films with the delafossite structure
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Reactive sputtering of CZTS
Part of Copper zinc tin sulfide-based thin film solar cells, p. 203-220, 2015.
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Gas flow sputtering of Cu(In,Ga)Se-2 for thin film solar cells
Part of 2015 IEEE 42ND PHOTOVOLTAIC SPECIALIST CONFERENCE (PVSC), 2015.
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Thin films composed of gold nanoparticles dispersed in a dielectric matrix: The influence of the host matrix on the optical and mechanical responses
Part of Thin Solid Films, p. 8-17, 2015.
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Thin films composed of Ag nanoclusters dispersed in TiO2: Influence of composition and thermal annealing on the microstructure and physical responses
Part of Applied Surface Science, p. 595-604, 2015.
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Highly textured AlN thin films on Si by reactive High Power Impulse Magnetron Sputtering
Part of 42nd ICMCTF 2015 International Conference on Metallurgical Coatings and Thin Films, 20–24 April, San Diego, USA, 2015.
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Magnetron sputtering of InGaZnO and ZnSnO amorphous oxide semiconductors
Part of E-MRS Spring meeting 2015, May 11-15, Lille, France, 2015.
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Metallization of nanostructures by High Power Impulse Magnetron Sputtering
Part of 4 th Magnetron, Ion processing & Arc Technologies European Conference, Paris, 8-11 December 2015, 2015.
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Applying "the upgraded Berg model" to predict hysteresis free reactive sputtering
Part of Surface & Coatings Technology, p. 39-43, 2015.
DOI for Applying "the upgraded Berg model" to predict hysteresis free reactive sputtering
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Deposition of highly textured AlN thin films by reactive high power impulse magnetron sputtering
Part of Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, 2015.
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Large-area homogeneous periodic surface structures generated on the surface sputtered boron carbide thin films by femtosecond laser processing
Part of Applied Surface Science, p. 161-169, 2015.
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Low temperature electronic transport in sputter deposited a-IGZO films
Part of Current applied physics, p. 1481-1485, 2014.
DOI for Low temperature electronic transport in sputter deposited a-IGZO films
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Dynamics of the sputtering target surface evolution in reactive HiPIMS
Part of Invited talk, 14th International Conference on Plasma Surface Engineering, September 15 - 19, 2014, Garmisch-Partenkirchen, Germany, 2014.
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Thin AlN films deposited by reactive HiPIMS and pulsed DC sputtering – a comparative study
Part of 14th International Conference on Plasma Surface Engineering, September 15 - 19, 2014, Garmisch-Partenkirchen, Germany, 2014.
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Reactive HiPIMS of Oxides: Hysteresis and Discharge behaviour
Part of Invited talk, 42th International Conference on Metallurgical Coatings and Thin Films, San Diego, CA, April 28 -May 2, 2014, 2014.
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Measurement of Ionized Metal Flux Fraction in HiPIMS by Retarding Field QCM Analyzer
Part of 41st International Conference on Metallurgical Coatings and Thin Films, San Diego, CA, April 28 - May 2, 2014, 2014.
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Infiltration of Spiro-MeOTAD hole transporting material into nanotubular TiO2 electrode for solid-state dye-sensitized solar cells
Part of Materials Science & Engineering, p. 67-74, 2014.
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Influence of composition, structure and testing atmosphere on the tribological performance of W-S-N coatings
Part of Surface & Coatings Technology, p. 86-94, 2014.
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Increasing the carbon deposition rate using sputter yield amplification upon serial magnetron co-sputtering
Part of Surface & Coatings Technology, p. 74-78, 2014.
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Mechanisms for compositional variations of coatings sputtered from a WS2 target
Part of Surface & Coatings Technology, p. 186-190, 2014.
DOI for Mechanisms for compositional variations of coatings sputtered from a WS2 target
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Hysteresis-free high rate reactive sputtering of niobium oxide, tantalumoxide, and aluminum oxide
Part of Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, p. 041517-, 2014.
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Upgrading the “Berg-model” for reactive sputtering processes
Part of Thin Solid Films, p. 186-192, 2014.
DOI for Upgrading the “Berg-model” for reactive sputtering processes
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Reactive sputtering of Cu2ZnSnS4 thin films - Target effects on the deposition process stability
Part of Surface & Coatings Technology, p. 281-285, 2014.
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Investigation of ionized metal flux fraction in HiPIMS discharges with Ti and Ni targets
Part of Surface & Coatings Technology, p. 152-157, 2014.
DOI for Investigation of ionized metal flux fraction in HiPIMS discharges with Ti and Ni targets
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Sputter Rate Distribution and Compositional Variations in Films Sputtered from Elemental and Multi-Element Targets at Different Pressures
Part of International Journal of Materials Science and Applications, p. 29-36, 2014.
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Phase formation and morphological stability of ultrathin Ni-Co-Pt silicide films formed onSi(100)
Part of Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, p. 031503-, 2014.
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Extreme friction reductions during inital running-in of W-S-C-Ti low-friction coatings
Part of 19th International Conference on Wear of Materials 2013; 14-18 April 2013; Portland, OR, USA, 2013.
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HiPIMS deposition of TiOx in an industrial-scale apparatus: Effects of target size and deposition geometry on hysteresis
Part of Surface & Coatings Technology, p. 714-719, 2013.
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A study of the process pressure influence in reactive sputtering aiming at hysteresis elimination
Part of Surface & Coatings Technology, p. 357-361, 2013.
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Unique UV-Erasable In-Ga-Zn-O TFT Memory With Self-Assembled Pt Nanocrystals
Part of IEEE Electron Device Letters, p. 1011-1013, 2013.
DOI for Unique UV-Erasable In-Ga-Zn-O TFT Memory With Self-Assembled Pt Nanocrystals
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Novel Zn-Doped Al2O3 Charge Storage Medium for Light-Erasable In-Ga-Zn-O TFT Memory
Part of IEEE Electron Device Letters, p. 1008-1010, 2013.
DOI for Novel Zn-Doped Al2O3 Charge Storage Medium for Light-Erasable In-Ga-Zn-O TFT Memory
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Effects of Back Contact Instability on Cu2ZnSnS4 Devices and Processes
Part of Chemistry of Materials, p. 3162-3171, 2013.
DOI for Effects of Back Contact Instability on Cu2ZnSnS4 Devices and Processes Download full text (pdf) of Effects of Back Contact Instability on Cu2ZnSnS4 Devices and Processes
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Anisotropic electrical resistivity during annealing of oriented columnar titanium films
Part of Materials letters (General ed.), p. 20-23, 2013.
DOI for Anisotropic electrical resistivity during annealing of oriented columnar titanium films
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Reactive magnetron sputtering: from fundamentals to high deposition rate processes
Part of Proceedings of the Twelfth th International Symposium on Sputtering & Plasma Processes ISSP 2013, p. 5-9, 2013.
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Tribochemically Active Ti–C–S Nanocomposite Coatings
Part of Materials Research Letters, p. 148-155, 2013.
DOI for Tribochemically Active Ti–C–S Nanocomposite Coatings Download full text (pdf) of Tribochemically Active Ti–C–S Nanocomposite Coatings
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Influence of Ti addition on the structure and properties of low-friction W–S–C coatings
Part of Surface & Coatings Technology, p. 340-348, 2013.
DOI for Influence of Ti addition on the structure and properties of low-friction W–S–C coatings
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Understanding the discharge current behavior in reactive high power impulse magnetron sputtering of oxides
Part of Journal of Applied Physics, p. 133302-, 2013.
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Annealing behavior of reactively sputtered precursor films for Cu2ZnSnS4 solar cells
Part of Thin Solid Films, p. 22-26, 2013.
DOI for Annealing behavior of reactively sputtered precursor films for Cu2ZnSnS4 solar cells Download full text (pdf) of Annealing behavior of reactively sputtered precursor films for Cu2ZnSnS4 solar cells
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Rapid annealing of reactively sputtered precursors for Cu2ZnSnS4 solar cells
Part of Progress in Photovoltaics, p. 10-17, 2013.
DOI for Rapid annealing of reactively sputtered precursors for Cu2ZnSnS4 solar cells
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Defect minimization and morphology optimization in TiO2 nanotube thin films, grown on transparent conducting substrate, for dye synthesized solar cell application
Part of Thin Solid Films, p. 71-78, 2012.
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A Detrimental Reaction at the Molybdenum Back Contact in Cu2ZnSn(S,Se)4 Thin-Film Solar Cells
Part of Journal of the American Chemical Society, p. 19330-19333, 2012.
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Mechanisms responsible for compositional variations of films sputtered from a WS2 target
Part of International Conference on Metallurgical Coatings and Thin films (ICMCTF) 23-27/04 2012, San Diego, abstract number:428, 2012.
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Sulfur-doping of nc-TiC/a-C films by reactive sputtering
Part of Thirteenth International Conference on Plasma Surface Engineering, Garmisch-Partenkirchen, Germany, 10-14 September 2012, 2012.
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Modelling of sputtering yield amplification in serial reactive magnetron co-sputtering
Part of Surface & Coatings Technology, p. 5055-5059, 2012.
DOI for Modelling of sputtering yield amplification in serial reactive magnetron co-sputtering
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Conformal Ni-silicide formation over three-dimensional device structures
Part of Applied Physics Letters, p. 053508-, 2012.
DOI for Conformal Ni-silicide formation over three-dimensional device structures
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Influence of precursor sulfur content on film formation and compositional changes in Cu2ZnSnS4 films and solar cells
Part of Solar Energy Materials and Solar Cells, p. 110-117, 2012.
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Epitaxy of Ultrathin NiSi2 Films with Predetermined Thickness
Part of Electrochemical and solid-state letters, p. H268-H270, 2011.
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Synthesis of c-tilted AlN films with a good tilt and thickness uniformity
Part of Proceedings of IEEE INTERNATIONAL ULTRASONICS SYMPOSIUM, p. 1238-1241, 2011.
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Synthesis and characterization of (0001)-textured wurtzite Al(1-x)B(x)N thin films
Part of Surface & Coatings Technology, p. 1033-1036, 2011.
DOI for Synthesis and characterization of (0001)-textured wurtzite Al(1-x)B(x)N thin films
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Chemical Insights into the Instability of Cu(2)ZnSnS(4) Films during Annealing
Part of Chemistry of Materials, p. 4625-4633, 2011.
DOI for Chemical Insights into the Instability of Cu(2)ZnSnS(4) Films during Annealing
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Sputter yield amplification by tungsten doping of Al(2)O(3) employing reactive serial co-sputtering: process characteristics and resulting film properties
Part of Journal of Physics D, p. 345501-, 2011.
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Studies of hysteresis effect in reactive HiPIMS deposition of oxides
Part of Surface & Coatings Technology, p. S303-S306, 2011.
DOI for Studies of hysteresis effect in reactive HiPIMS deposition of oxides
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Implantation and surface modification of TiO2 by a Focused Ion Beam
Part of E-MRS 2011 Spring Meeting, 2011.
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Serial magnetron co-sputtering: Sputtering yield amplification and process modelling
Part of E-MRS 2011 Spring Meeting, 2011.
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Ion irradiation-induced modification of TiO2 thin films
Part of E-MRS 2011 Spring Meeting, 2011.
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Nanocomposite coatings consisting of noble metal nanoclusters embedded into a dielectric matrix by reactive HIPIMS
Part of 2nd International Conference on Fundamentals and Applications of HIPIMS, June 2011, Braunschweig, 2011.
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Modelling of target effects in reactive HIPIMS
Part of 2nd Internation Conference on Fundamentals and Applications of HIPIMS, June 2011, Braunschweig, 2011.
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Effect of peak power in reactive high power impulse magnetron sputtering of titanium dioxide
Part of Surface & Coatings Technology, p. 4828-4831, 2011.
DOI for Effect of peak power in reactive high power impulse magnetron sputtering of titanium dioxide
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Process modelling for reactive magnetron sputtering
Part of Potential and Applications of Thin Ceramic and Metal Coatings 2011. 2nd PATCMC, 6th - 8th June, 2011 Plzeň, Czech Republic, p. 25-28, 2011.
Download full text (pdf) of Process modelling for reactive magnetron sputtering
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Epitaxy of Ultrathin NiSi2 Films with Predetermined Thickness
Part of Electrochemical and solid-state letters, p. H268-H270, 2011.
DOI for Epitaxy of Ultrathin NiSi2 Films with Predetermined Thickness
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Localised modifications of anatase TiO2 thin films by a Focused Ion Beam
Part of Nuclear Instruments and Methods in Physics Research Section B, p. 3142-3146, 2010.
DOI for Localised modifications of anatase TiO2 thin films by a Focused Ion Beam
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Modelling of sputtering yield amplification effect in reactive deposition of oxides
Part of Surface & Coatings Technology, p. 3882-3886, 2010.
DOI for Modelling of sputtering yield amplification effect in reactive deposition of oxides
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ERD analysis and modification of TiO2 thin films with heavy ions
Part of Nuclear Instruments and Methods in Physics Research Section B, p. 1893-1898, 2010.
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Modelling of low energy ion sputtering from oxide surfaces
Part of Journal of Physics D, p. 205204-, 2010.
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Studies and Modelling of Surface Modifications of Different Oxides During Ion Bombardmen
Part of Presented at the 7th Asian-European International Conference on Plasma Surface Engineering (AEPSE 2009), Busan, South Korea, September 20-25, 2009, 2009.
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Stable High Rate Reactive Sputter Deposition of Aluminium Oxide from Segmented Targets of Aluminium and Aluminium Oxide
Part of Presented at the International Symposium on Reactive Sputter Deposition (RSD2009), Manchester, United Kingdom, December 10-11, 2009, 2009.
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Decorative Oxide Coatings: Colour Control by Compositional Gradient
Part of E-MRS 2009, Spring Meeting in Strasbourgh, France, June 8-12, 2009, 2009.
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Increase of the Deposition Rate in Reactive Sputtering of Metal Oxides using a Ceramic Nitride Target
Part of Journal of Applied Physics, p. 093302-, 2009.
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Implantation of anatase thin film with 100 keV 56Fe ions: Damage formation and magnetic behaviour
Part of Nuclear Instruments and Methods in Physics Research Section B, p. 2725-2730, 2009.
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Reactively sputtered ZrN for application as reflecting back contact in Cu(In,Ga)Se-2 solar cells
Part of Thin Solid Films, p. 5548-5552, 2009.
DOI for Reactively sputtered ZrN for application as reflecting back contact in Cu(In,Ga)Se-2 solar cells Download full text (pdf) of Reactively sputtered ZrN for application as reflecting back contact in Cu(In,Ga)Se-2 solar cells
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Damage formation in TiO2 by heavy ions: consequences for micro- and nano-struring
Part of 7th International Symposium on Swift Heavy Ions in Matter (SHIM2008), 2008.
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Magnetic behaviour of Fe implanted TiO2 thin films
Part of Book of Abstracts, 2008.
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Experiments and modeling of dual reactive magnetron sputtering using two reactive gases
Part of Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, p. 565-570, 2008.
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Nanoscale colour control: W-O graded coatings deposited by magnetron sputtering
Part of Nanotechnology, p. 395202-, 2008.
DOI for Nanoscale colour control: W-O graded coatings deposited by magnetron sputtering
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A model of DC reactive magnetron sputtering for graded solar thermal absorbers
Part of Journal of Physics, Conference Series, p. 082024-, 2008.
DOI for A model of DC reactive magnetron sputtering for graded solar thermal absorbers
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High rate reactive magnetron sputter deposition of titanium oxide
Part of Applied Physics Letters, p. 221501-, 2008.
DOI for High rate reactive magnetron sputter deposition of titanium oxide
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Modelling of Magnetron Sputtering of Tungsten Oxide with Reactive Gas Pulsing
Part of Plasma Processes and Polymers, p. S522-S526, 2007.
DOI for Modelling of Magnetron Sputtering of Tungsten Oxide with Reactive Gas Pulsing
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State of the art in Reactive Magnetron Sputtering
Part of Invited to The third Mikkeli International Industrial Coating Seminar, MIICS 2006, Mikkeli, Finland, March 16-18, 2006 and Conference Proceedings, 2006.
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Process Stabilization and Increase of the Deposition Rate in Reactive Sputtering of Metal Oxides and Oxynitrides
Part of Appl Phys Lett, 2006.
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Dynamic behaviour of the reactive sputtering process
Part of Thin Solid Films, p. 421-424, 2006.
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Modelling of the Plasma Impedance in Reactive Magnetron Sputtering for Various Traget Materials
Part of Proceedings of the 48th Annual Society of Vacuum Coaters Technical Conference in Denver, April 23-28, p. 298-301, 2005.
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Modelling of Sputter Erosion Rate Enchancement from Ceramic Targets
Part of Proc of the 48th Annual Society of Vacuum Coaters Technical Conference in Denver, USA, p. 298-301, 2005.
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Dynamic Behaviour of the Reactive Sputtering Process
Part of Presented at 13th International Congress on Thin Films 8th International Conference on Atomically Controlled Surfaces, Interfaces & Nanostructures (ICTF13/ACSIN8) in Stockholm, Sweden, 19-23 June 2005, 2005.
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Kinetic behaviour of target poisoning during reactive sputtering
Part of Reactive Sputter Deposition 2005 in Delft, The Netherlands, 2005.
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Ionenimplantation beim reaktiven Sputtern
Part of Presented at the 69. Annual Meeting of the Deutsche Physikalische Gesellschaft in Berlin, March, 2005.
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Ion Implantation Effects in Reactive Sputter Deposition
Part of Presented at the 14th Int. Conf. on Surface Modification of Materials by Ion Beams (SMMIB’05) in Kusadasi, Turkey, 4-9 September, 2005.
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Reactive Sputtering – Experiments and Modelling
Part of Invited to Sweden-China Symposium on Materials Science in Beijing, China, 10-13 May, 2005.
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Experimental Studies of the Dynamic Behavior of the Reactive Sputtering Process
Part of Presented at the 5th Asian-European Int. Conf. on Plasma Surface Engineering (AEPSE 2005) in Qingdao City, China, 12-16 September, 2005.
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Eliminating the hysteresis effect for reactive sputtering processes
Part of Appl Phys Lett, 2005.
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Fundamental understanding and modeling of reactive sputtering process
Part of Thin Solid Films, p. 215-230, 2005.
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Advances in Heuristic and Monte-Carlo Simulation of Reactive Sputtering and Technical Application
Part of Invited to the Symposium on Reactive Sputter Processes and Related Phenomena III, Ghent, Belgium, December 9-10, 2004.
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A Simplified Treatment of Target Implantation Effects in Reactive Sputtering
Part of The International Conference on Metallurgical Coatings and Thin Films in San Diego, USA, 2004.
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Modelling of Sputter Erosion Rate Enhancement from Ceramic Targets
Part of Proceedings of Society of Vacuum Coaters, p. 324.328-, 2004.
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Deposition of Ti2AIC and Ti3AIC2 epitaxial films by magnetron sputtering
Part of Applied Physics Letters, p. 1066-1067, 2004.
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Heuristic model of the plasma impedance in reactive magnetron sputtering
Part of 5th International Conference on Coatings on Glass, Saarbrücken, Germany, July, 2004.
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Influence of rotating magnets on hysteresis in reactive sputtering
Part of Society of Vacuum Coaters, 7th Annual Technical Conference Proceedings, April, 2004.
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Complex Target Poisoning Effects in Reactive Sputtering
Part of American Vacuum Society Symposium & Exhibition, Anaheim USA, 2004.
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Basic Understanding of Reactive Sputtering Processes
Part of Invited to the AVS 50th National Symposium in Baltimore, Maryland, USA, November 2-7, 2003, 2003.
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Basic Understanding of the Pulsed DC Reactive Spitter Deposition Process
Part of The 4th Asian-European Int Conf on Plasma Surface Engineering, AEPSE 2003, Jeju City, South Korea, September 28-October 2, 2003, 2003.
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Control of reactive sputtering process using two reactive gases
Part of Proc. of the AVS 4th International Conference on Microelectronics & Interfaces, Santa Clara, USA, p. 98-103, 2003.
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Stable Reactive Sputtering Processes
Part of ISSP 2003, The 7th International Symposium on Sputtering & Plasma Processes, June 11-13, Kanazawa, Japan, p. 235-239, 2003.
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Stable reactive sputtering using 2 reactive gases
Part of ICMCTF 2003, The International Conference on Metallurgical Coatings and Thin Films April 28 - May 2, San Diego, USA, 2003.
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Experimental and computer simulation studies of the
Part of J Vac Sci Technol, p. 1981-1987, 2003.
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Dynamic simulations of pulsed reactive sputtering processes
Part of J Vac Sci Technol, p. 503-508, 2000.
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Frequency response in pulsed DC reactive sputtering processes
Part of Thin Solid Films, p. 43-48, 2000.
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Basic Understanding of the Pulsed DC Reactive Sputter Deposition Process
Part of Invited to Second Asian-European Int Conf on Plasma Surface Engineering (AEPSE´99), Beijing, September 15-19, 1999.
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Target compound layer formation during reactive sputtering
Part of JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, p. 1827-1831, 1999.
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Target Compound Layer Formation during Reactive Sputtering
Part of Presented at AVS 45th National Symposium in Baltimore, Maryland, USA, November 2-6, 1998.
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Modeling of the deposition of stoichiometric Al2O3 using nonarcing direct current magnetron sputtering
Part of J Vac Sci Technol A, p. 1286-1292, 1998.
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Composition control by current modulation in dc-reactive sputtering
Part of JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, p. 1868-1872, 1998.
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Computer modeling as a tool to predict deposition rate and film composition in the reactive sputtering process
Part of JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, p. 1277-1285, 1998.
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The influence of the deposition angle on the composition of reactively sputtered thin films
Part of SURFACE & COATINGS TECHNOLOGY, p. 242-246, 1997.
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Diamond deposition from halogenated methane precursors on Si and SiC substrates
Part of Diamond and Related Materials, p. 85-88, 1997.
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Studies of reactive sputtering of multi-phase chromium nitride
Part of JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, p. 248-252, 1997.
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Probe depth variation in grazing exit soft-X-ray emission spectroscopy
Part of NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, p. 558-562, 1997.
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In situ diagnostic studies of reactive co-sputtering from two targets by means of soft x-ray and optical emission spectroscopy
Part of JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, p. 145-148, 1997.
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Diamond deposition in a microwave electrode discharge at reduced pressures
Part of DIAMOND AND RELATED MATERIALS, p. 224-229, 1997.