Publications

Photocatalytic activity of TiO2 deposited by reactive HiPIMS with long target-to-substrate distance

Fernandes, Daniel Filipe Félix; Österlund, Lars; Kubart, Tomas

Part of Surface & Coatings Technology, 2023.

DOI for Photocatalytic activity of TiO2 deposited by reactive HiPIMS with long target-to-substrate distance Download full text (pdf) of Photocatalytic activity of TiO2 deposited by reactive HiPIMS with long target-to-substrate distance

Atomic Layer Deposition of SnO₂ as an Electron Transport Material for Solid-State P-type Dye-Sensitized Solar Cells

Cheng, Haoliang; Liu, Yawen; Cai, Bin; Hägglund, Carl et al.

Part of ACS Applied Energy Materials, p. 12022-12028, 2022.

DOI for Atomic Layer Deposition of SnO₂ as an Electron Transport Material for Solid-State P-type Dye-Sensitized Solar Cells Download full text (pdf) of Atomic Layer Deposition of SnO₂ as an Electron Transport Material for Solid-State P-type Dye-Sensitized Solar Cells

Wafer-sized WS2 monolayer deposition by sputtering

Villamayor, Michelle Marie S.; Husain, Sajid; Oropesa-Nuñez, Reinier; Johansson, Fredrik et al.

Part of Nanoscale, p. 6331-6338, 2022.

DOI for Wafer-sized WS2 monolayer deposition by sputtering Download full text (pdf) of Wafer-sized WS2 monolayer deposition by sputtering

Wide-Gap Chalcopyrite Solar Cells with Indium Oxide-Based Transparent Back Contacts

Keller, Jan; Stolt, Lars; Donzel-Gargand, Olivier; Kubart, Tomas et al.

Part of Solar RRL, 2022.

DOI for Wide-Gap Chalcopyrite Solar Cells with Indium Oxide-Based Transparent Back Contacts Download full text (pdf) of Wide-Gap Chalcopyrite Solar Cells with Indium Oxide-Based Transparent Back Contacts

High Performance Full-Inorganic Flexible Memristor with Combined Resistance-Switching

Zhu, Yuan; Liang, Jia-sheng; Mathayan, Vairavel; Nyberg, Tomas et al.

Part of ACS Applied Materials and Interfaces, p. 21173-21180, 2022.

DOI for High Performance Full-Inorganic Flexible Memristor with Combined Resistance-Switching Download full text (pdf) of High Performance Full-Inorganic Flexible Memristor with Combined Resistance-Switching

Synthesis of BaZrS₃ Perovskite Thin Films at a Moderate Temperature on Conductive Substrates

Comparotto, Corrado; Ström, Petter; Donzel-Gargand, Olivier; Kubart, Tomas et al.

Part of ACS Applied Energy Materials, p. 6335-6343, 2022.

DOI for Synthesis of BaZrS₃ Perovskite Thin Films at a Moderate Temperature on Conductive Substrates Download full text (pdf) of Synthesis of BaZrS₃ Perovskite Thin Films at a Moderate Temperature on Conductive Substrates

Resilient moth-eye nanoimprinted antireflective and self-cleaning TiO2 sputter-coated PMMA films

Jacobo-Martin, Alejandra; Hernandez, Jaime J.; Solano, Eduardo; Monclus, Miguel A. et al.

Part of Applied Surface Science, 2022.

DOI for Resilient moth-eye nanoimprinted antireflective and self-cleaning TiO2 sputter-coated PMMA films

Self-Limited Formation of Bowl-Shaped Nanopores for Directional DNA Translocation

Pham, Ngan Hoang; Yao, Yao; Wen, Chenyu; Li, Shiyu et al.

Part of ACS Nano, p. 17938-17946, 2021.

DOI for Self-Limited Formation of Bowl-Shaped Nanopores for Directional DNA Translocation Download full text (pdf) of Self-Limited Formation of Bowl-Shaped Nanopores for Directional DNA Translocation

On the description of metal ion return in reactive high power impulse magnetron sputtering

Kubart, Tomas; Fernandes, Daniel Filipe Félix; Nyberg, Tomas

Part of Surface & Coatings Technology, 2021.

DOI for On the description of metal ion return in reactive high power impulse magnetron sputtering Download full text (pdf) of On the description of metal ion return in reactive high power impulse magnetron sputtering

Superconducting V3Si for quantum circuit applications

Vethaak, T. D.; Gustavo, F.; Farjot, T.; Kubart, Tomas et al.

Part of Microelectronic Engineering, 2021.

DOI for Superconducting V3Si for quantum circuit applications

Growth of two-dimensional WS2 thin films by reactive sputtering

Villamayor, Michelle Marie S.; Lindblad, Andreas; Johansson, Fredrik; Tran, Tuan et al.

Part of Vacuum, 2021.

DOI for Growth of two-dimensional WS2 thin films by reactive sputtering

Substrate Effects on Crystal Phase in Atomic Layer Deposition of Tin Monosulfide

Bilousov, Oleksandr V.; Voznyi, Andrii; Landeke-Wilsmark, Björn; Villamayor, Michelle Marie S. et al.

Part of Chemistry of Materials, p. 2901-2912, 2021.

DOI for Substrate Effects on Crystal Phase in Atomic Layer Deposition of Tin Monosulfide Download full text (pdf) of Substrate Effects on Crystal Phase in Atomic Layer Deposition of Tin Monosulfide

Influence of substrate-induced thermal stress on the superconducting properties of V3Si thin films

Vethaak, T. D.; Gustavo, F.; Farjot, T.; Kubart, Tomas et al.

Part of Journal of Applied Physics, 2021.

DOI for Influence of substrate-induced thermal stress on the superconducting properties of V3Si thin films

Correlation between Substrate Ion Fluxes and the Properties of Diamond-Like Carbon Films Deposited by Deep Oscillation Magnetron Sputtering in Ar and Ar plus Ne Plasmas

Oliveira, Joao; Ferreira, Fabio; Serra, Ricardo; Kubart, Tomas et al.

Part of Coatings, 2020.

DOI for Correlation between Substrate Ion Fluxes and the Properties of Diamond-Like Carbon Films Deposited by Deep Oscillation Magnetron Sputtering in Ar and Ar plus Ne Plasmas Download full text (pdf) of Correlation between Substrate Ion Fluxes and the Properties of Diamond-Like Carbon Films Deposited by Deep Oscillation Magnetron Sputtering in Ar and Ar plus Ne Plasmas

Electronic excitation of transition metal nitrides by light ions with keV energies

Bruckner, Barbara; Hans, Marcus; Nyberg, Tomas; Greczynski, Grzegorz et al.

Part of Journal of Physics, 2020.

DOI for Electronic excitation of transition metal nitrides by light ions with keV energies

High power impulse magnetron sputtering of diamond-like carbon coatings

Kubart, Tomas; Aijaz, Asim; Andersson, Joakim; Ferreira, Fabio et al.

Part of Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, 2020.

DOI for High power impulse magnetron sputtering of diamond-like carbon coatings

Tailoring residual stresses in CrN_x films on alumina and silicon deposited by high-power impulse magnetron sputtering

Elo, Robin; Jacobson, Staffan; Kubart, Tomas

Part of Surface & Coatings Technology, 2020.

DOI for Tailoring residual stresses in CrN_x films on alumina and silicon deposited by high-power impulse magnetron sputtering Download full text (pdf) of Tailoring residual stresses in CrN_x films on alumina and silicon deposited by high-power impulse magnetron sputtering

Chalcogenide Perovskite BaZrS3: Thin Film Growth by Sputtering and Rapid Thermal Processing

Comparotto, Corrado; Davydova, Alexandra; Ericson, Tove; Riekehr, Lars et al.

Part of ACS Applied Energy Materials, p. 2762-2770, 2020.

DOI for Chalcogenide Perovskite BaZrS3: Thin Film Growth by Sputtering and Rapid Thermal Processing Download full text (pdf) of Chalcogenide Perovskite BaZrS3: Thin Film Growth by Sputtering and Rapid Thermal Processing

A Strategy for Alleviating Micro Arcing during HiPIMS Deposition of DLC Coatings

Vitelaru, Catalin; Parau, Anca Constantina; Constantin, Lidia Ruxandra; Kiss, Adrian Emil et al.

Part of Materials, 2020.

DOI for A Strategy for Alleviating Micro Arcing during HiPIMS Deposition of DLC Coatings Download full text (pdf) of A Strategy for Alleviating Micro Arcing during HiPIMS Deposition of DLC Coatings

Reactive high power impulse magnetron sputtering

Kubart, Tomas; Gudmundsson, Jon Tomas; Lundin, Daniel

Part of High Power Impulse Magnetron Sputtering, p. 223-263, 2020.

DOI for Reactive high power impulse magnetron sputtering

Room Temperature Reactive Deposition of InGaZnO and ZnSnO Amorphous Oxide Semiconductors for Flexible Electronics

Prusakova, Lucie; Hubik, Pavel; Aijaz, Asim; Nyberg, Tomas et al.

Part of Coatings, 2020.

DOI for Room Temperature Reactive Deposition of InGaZnO and ZnSnO Amorphous Oxide Semiconductors for Flexible Electronics Download full text (pdf) of Room Temperature Reactive Deposition of InGaZnO and ZnSnO Amorphous Oxide Semiconductors for Flexible Electronics

Back and front contacts in kesterite solar cells: state-of-the-art and open questions

Platzer Björkman, Charlotte; Barreau, Nicolas; Bär, Marcus; Choubrac, Leo et al.

Part of Journal of Physics, 2019.

DOI for Back and front contacts in kesterite solar cells: state-of-the-art and open questions Download full text (pdf) of Back and front contacts in kesterite solar cells: state-of-the-art and open questions

Antimony-Doped Tin Oxide as Transparent Back Contact in Cu₂ZnSnS₄ Thin-Film Solar Cells

Englund, Sven; Kubart, Tomas; Keller, Jan; Moro, Marcos V. et al.

Part of Physica Status Solidi (a) applications and materials science, 2019.

DOI for Antimony-Doped Tin Oxide as Transparent Back Contact in Cu₂ZnSnS₄ Thin-Film Solar Cells Download full text (pdf) of Antimony-Doped Tin Oxide as Transparent Back Contact in Cu₂ZnSnS₄ Thin-Film Solar Cells

Mechanistic Insights into Solid-State p-Type Dye-Sensitized Solar Cells

Tian, Lei; Törndahl, Tobias; Ling, Junzhong; Pati, Palas Baran et al.

Part of The Journal of Physical Chemistry C, p. 26151-26160, 2019.

DOI for Mechanistic Insights into Solid-State p-Type Dye-Sensitized Solar Cells

A simple model for non-saturated reactive sputtering processes

Nyberg, Tomas; Högberg, H.; Greczynski, G.; Berg, Sören

Part of Thin Solid Films, 2019.

DOI for A simple model for non-saturated reactive sputtering processes Download full text (pdf) of A simple model for non-saturated reactive sputtering processes

Hydrogen site location in ultrathin vanadium layers by N-15 nuclear reaction analysis

Komander, Kristina; Moro, Marcos V.; Droulias, Sotirios A.; Müggenburg, J. et al.

Part of Nuclear Instruments and Methods in Physics Research Section B, p. 57-60, 2019.

DOI for Hydrogen site location in ultrathin vanadium layers by N-15 nuclear reaction analysis

Metal Filling by High Power Impulse Magnetron Sputtering

Jablonka, Lukas; Moskovkin, Pavel; Zhang, Zhen; Zhang, Shi-Li et al.

Part of Journal of Physics D, 2019.

DOI for Metal Filling by High Power Impulse Magnetron Sputtering

On the Z(1)-dependence of electronic stopping in TiN

Sortica, Mauricio A.; Paneta, Valentina; Bruckner, Barbara; Lohmann, Svenja et al.

Part of Scientific Reports, 2019.

DOI for On the Z(1)-dependence of electronic stopping in TiN Download full text (pdf) of On the Z(1)-dependence of electronic stopping in TiN

Mechanical Properties of Hydrogen Free Diamond-Like Carbon Thin Films Deposited by High Power Impulse Magnetron Sputtering with Ne

Aijaz, Asim; Ferreira, Fabio; Oliveira, Joao; Kubart, Tomas

Part of Coatings, 2018.

DOI for Mechanical Properties of Hydrogen Free Diamond-Like Carbon Thin Films Deposited by High Power Impulse Magnetron Sputtering with Ne Download full text (pdf) of Mechanical Properties of Hydrogen Free Diamond-Like Carbon Thin Films Deposited by High Power Impulse Magnetron Sputtering with Ne

Organs-on-Chip System with Integrated Transparent Conductive Oxide Electrodes

Johansson, Sofia; Porras, Ana Maria; Searle, Sean; Barbe, Laurent et al.

2018.

Bifacial Cu(In,Ga)Se₂ solar cells using hydrogen‐doped In₂O₃ films as a transparent back contact

Keller, Jan; Chen, Wei-Chao; Riekehr, Lars; Kubart, Tomas et al.

Part of Progress in Photovoltaics, p. 846-858, 2018.

DOI for Bifacial Cu(In,Ga)Se₂ solar cells using hydrogen‐doped In₂O₃ films as a transparent back contact

Using hydrogen‐doped In₂O₃ films as a transparent back contact in (Ag,Cu)(In,Ga)Se₂ solar cells

Keller, Jan; Shariati, Masumeh-Nina; Aijaz, Asim; Riekehr, Lars et al.

Part of Progress in Photovoltaics, p. 159-170, 2018.

DOI for Using hydrogen‐doped In₂O₃ films as a transparent back contact in (Ag,Cu)(In,Ga)Se₂ solar cells

Discharge runaway in high power impulse magnetron sputtering of carbon: the effect of gas pressure, composition and target peak voltage

Vitelaru, Catalin; Aijaz, Asim; Parau, Anca Constantina; Kiss, Adrian Emil et al.

Part of Journal of Physics D, 2018.

DOI for Discharge runaway in high power impulse magnetron sputtering of carbon: the effect of gas pressure, composition and target peak voltage

Solid state p-type dye sensitized NiO-dye-TiO2 core-shell solar cells

Tian, Lei; Föhlinger, Jens; Zhang, Zhi-Bin; Pati, Palas Baran et al.

Part of Chemical Communications, p. 3739-3742, 2018.

DOI for Solid state p-type dye sensitized NiO-dye-TiO2 core-shell solar cells

Hard and dense diamond like carbon coatings deposited by deep oscillations magnetron sputtering

Ferreira, Fabio; Aijaz, Asim; Kubart, Tomas; Cavaleiro, Albano et al.

Part of Surface & Coatings Technology, p. 92-98, 2018.

DOI for Hard and dense diamond like carbon coatings deposited by deep oscillations magnetron sputtering

Improving the morphological stability of nickel germanide by tantalum and tungsten additions

Jablonka, Lukas; Kubart, Tomas; Gustavsson, Fredrik; Descoins, Marion et al.

Part of Applied Physics Letters, 2018.

DOI for Improving the morphological stability of nickel germanide by tantalum and tungsten additions Download full text (pdf) of Improving the morphological stability of nickel germanide by tantalum and tungsten additions

Highly conductive ultrathin Co films by high-power impulse magnetron sputtering

Jablonka, Lukas; Riekehr, Lars; Zhang, Zhen; Zhang, Shi-Li et al.

Part of Applied Physics Letters, 2018.

DOI for Highly conductive ultrathin Co films by high-power impulse magnetron sputtering Download full text (pdf) of Highly conductive ultrathin Co films by high-power impulse magnetron sputtering

Ultrafast dye regeneration in a core-shell NiO-dye-TiO2 mesoporous film

Tian, Lei; Föhlinger, Jens; Pati, Palas Baran; Zhang, Zhi-Bin et al.

Part of Physical Chemistry, Chemical Physics - PCCP, p. 36-40, 2018.

DOI for Ultrafast dye regeneration in a core-shell NiO-dye-TiO2 mesoporous film Download full text (pdf) of Ultrafast dye regeneration in a core-shell NiO-dye-TiO2 mesoporous film

Effect of KF absorber treatment on the functionality of different transparent conductive oxide layers in CIGSe solar cells

Keller, Jan; Chalvet, Francis; Joel, Jonathan; Aijaz, Asim et al.

Part of Progress in Photovoltaics, p. 13-23, 2018.

DOI for Effect of KF absorber treatment on the functionality of different transparent conductive oxide layers in CIGSe solar cells

Composition, structure and magnetic properties of ultra-thin Fe/Ni multilayers sputter deposited on epitaxial Cu/Si(001)

Frisk, Andreas; Ali, Hasan; Svedlindh, Peter; Leifer, Klaus et al.

Part of Thin Solid Films, p. 117-125, 2018.

DOI for Composition, structure and magnetic properties of ultra-thin Fe/Ni multilayers sputter deposited on epitaxial Cu/Si(001)

Electronic energy-loss mechanisms for H, He, and Ne in TiN

Sortica, Mauricio A.; Paneta, Valentina; Bruckner, Barbara; Lohmann, Svenja et al.

Part of Physical Review A: covering atomic, molecular, and optical physics and quantum information, 2017.

DOI for Electronic energy-loss mechanisms for H, He, and Ne in TiN

Ion induced stress relaxation in dense sputter-deposited DLC thin films

Aijaz, Asim; Kubart, Tomas

Part of Applied Physics Letters, 2017.

DOI for Ion induced stress relaxation in dense sputter-deposited DLC thin films

Formation of nickel germanides from Ni layers with thickness below 10 nm

Jablonka, Lukas; Kubart, Tomas; Primetzhofer, Daniel; Abedin, Ahmad et al.

Part of Journal of Vacuum Science & Technology B, 2017.

DOI for Formation of nickel germanides from Ni layers with thickness below 10 nm

Evolution of sputtering target surface composition in reactive high power impulse magnetron sputtering

Kubart, Tomas; Aijaz, Asim

Part of Journal of Applied Physics, 2017.

DOI for Evolution of sputtering target surface composition in reactive high power impulse magnetron sputtering Download full text (pdf) of Evolution of sputtering target surface composition in reactive high power impulse magnetron sputtering

Minimizing sputter-induced damage during deposition of WS₂ onto graphene

Johansson, Fredrik; Ahlberg, Patrik; Jansson, Ulf; Zhang, Shi-Li et al.

Part of Applied Physics Letters, 2017.

DOI for Minimizing sputter-induced damage during deposition of WS₂ onto graphene Download full text 1 (pdf) of Minimizing sputter-induced damage during deposition of WS₂ onto graphene Download full text 2 (pdf) of Minimizing sputter-induced damage during deposition of WS₂ onto graphene

Synthesis of hydrogenated diamondlike carbon thin films using neon-acetylene based high power impulse magnetron sputtering discharges

Aijaz, Asim; Louring, Sascha; Lundin, Daniel; Kubart, Tomas et al.

Part of Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, 2016.

DOI for Synthesis of hydrogenated diamondlike carbon thin films using neon-acetylene based high power impulse magnetron sputtering discharges

Massive Ta diffusion observed in Cu thin films but not in Ag counterparts

Mardani, Shabnam; Norström, Hans; Gustavsson, Fredrik; Nyberg, Tomas et al.

Part of Journal of Vacuum Science & Technology B, 2016.

DOI for Massive Ta diffusion observed in Cu thin films but not in Ag counterparts

Direct comparison of atomic layer deposition and sputtering of In2O3:H used as transparent conductive oxide layer in CuIn1-xGaxSe2 thin film solar cells

Keller, Jan; Aijaz, Asim; Gustavsson, Fredrik; Kubart, Tomas et al.

Part of Solar Energy Materials and Solar Cells, p. 757-764, 2016.

DOI for Direct comparison of atomic layer deposition and sputtering of In2O3:H used as transparent conductive oxide layer in CuIn1-xGaxSe2 thin film solar cells

Broadband Optical Absorption Caused by the Plasmonic Response of Coalesced Au Nanoparticles Embedded in a TiO2 Matrix

Borges, J.; Pereira, R. M. S.; Rodrigues, M. S.; Kubart, Tomas et al.

Part of The Journal of Physical Chemistry C, p. 16931-16945, 2016.

DOI for Broadband Optical Absorption Caused by the Plasmonic Response of Coalesced Au Nanoparticles Embedded in a TiO2 Matrix

Toward synthesis of oxide films on graphene with sputtering based processes

Ahlberg, Patrik; Nyberg, Tomas; Zhang, Shi-Li; Zhang, Zhi-Bin et al.

Part of Journal of Vacuum Science & Technology B, 2016.

DOI for Toward synthesis of oxide films on graphene with sputtering based processes

E-MRS 2015 Symposium EE: Protective coatings and thin films Preface

Pierson, Jean-Francois; Cekada, Miha; Kubart, Tomas; Sanjines, Rosendo

Part of Surface & Coatings Technology, p. 1-1, 2016.

DOI for E-MRS 2015 Symposium EE: Protective coatings and thin films Preface

Hard and elastic epitaxial ZrB2 thin films on Al2O3(0001) substrates deposited by magnetron sputtering from a ZrB2 compound target

Tengdelius, Lina; Broitman, Esteban; Lu, Jun; Eriksson, Fredrik et al.

Part of Acta Materialia, p. 166-172, 2016.

DOI for Hard and elastic epitaxial ZrB2 thin films on Al2O3(0001) substrates deposited by magnetron sputtering from a ZrB2 compound target

Applying "the upgraded Berg model" to predict hysteresis free reactive sputtering

Särhammar, Erik; Nyberg, Tomas; Berg, Sören

p. 34-38 2016.

DOI for Applying "the upgraded Berg model" to predict hysteresis free reactive sputtering

Low-temperature synthesis of thermochromic vanadium dioxide thin films by reactive high power impulse magnetron sputtering

Aijaz, Asim; Ji, Yu-Xia; Montero, Jose; Niklasson, Gunnar A. et al.

Part of Solar Energy Materials and Solar Cells, p. 137-144, 2016.

DOI for Low-temperature synthesis of thermochromic vanadium dioxide thin films by reactive high power impulse magnetron sputtering

Architectured columns with a metal-dielectric periodic nanostructure

Martin, Nicolas; Cacucci, Arnaud; Potin, Valerie; Imhoff, Luc et al.

Part of Materials letters (General ed.), p. 128-131, 2016.

DOI for Architectured columns with a metal-dielectric periodic nanostructure

Defect formation in graphene during low-energy ion bombardment

Ahlberg, Patrik; Johansson, Fredrik; Zhang, Zhibin; Jansson, Ulf et al.

Part of APL Materials, 2016.

DOI for Defect formation in graphene during low-energy ion bombardment Download full text (pdf) of Defect formation in graphene during low-energy ion bombardment

Scalability Study of Nickel Germanides

Jablonka, Lukas; Kubart, Thomas; Gustavsson, Fredrik; Primetzhofer, Daniel et al.

2016.

Combinatorial magnetron sputtering of AgFeO2 thin films with the delafossite structure

Mao, Fang; Nyberg, Tomas; Thersleff, Thomas; Andersson, Anna et al.

Part of Materials & design, p. 132-142, 2016.

DOI for Combinatorial magnetron sputtering of AgFeO2 thin films with the delafossite structure Download full text (pdf) of Combinatorial magnetron sputtering of AgFeO2 thin films with the delafossite structure

Reactive sputtering of CZTS

Platzer Björkman, Charlotte; Ericson, Tove; Scragg, Jonathan; Kubart, Tomas

Part of Copper zinc tin sulfide-based thin film solar cells, p. 203-220, 2015.

Gas flow sputtering of Cu(In,Ga)Se-2 for thin film solar cells

Edoff, Marika; Lindahl, Johan; Wätjen, Timo; Nyberg, Tomas

Part of 2015 IEEE 42ND PHOTOVOLTAIC SPECIALIST CONFERENCE (PVSC), 2015.

Thin films composed of gold nanoparticles dispersed in a dielectric matrix: The influence of the host matrix on the optical and mechanical responses

Borges, J.; Rodrigues, M. S.; Kubart, Tomas; Kumar, S. et al.

Part of Thin Solid Films, p. 8-17, 2015.

DOI for Thin films composed of gold nanoparticles dispersed in a dielectric matrix: The influence of the host matrix on the optical and mechanical responses

Thin films composed of Ag nanoclusters dispersed in TiO2: Influence of composition and thermal annealing on the microstructure and physical responses

Borges, J.; Rodrigues, M. S.; Lopes, C.; Costa, D. et al.

Part of Applied Surface Science, p. 595-604, 2015.

DOI for Thin films composed of Ag nanoclusters dispersed in TiO2: Influence of composition and thermal annealing on the microstructure and physical responses

Industrial Scale Deposition of Diamond-like Carbon Thin Films using Ne-based HiPIMS Discharge

Aijaz, Asim; Carreri, Felipe de Campos; Sabelfeld, Alex; Gerdes, Holger et al.

2015.

Highly textured AlN thin films on Si by reactive High Power Impulse Magnetron Sputtering

Kubart, Tomas; Törndahl, Tobias; Moreira, Milena; Katardjiev, Ilia

Part of 42nd ICMCTF 2015 International Conference on Metallurgical Coatings and Thin Films, 20–24 April, San Diego, USA, 2015.

Magnetron sputtering of InGaZnO and ZnSnO amorphous oxide semiconductors

Prusakova, Lucie; Aijaz, Asim; Nyberg, Tomas; Törndahl, Tobias et al.

Part of E-MRS Spring meeting 2015, May 11-15, Lille, France, 2015.

Metallization of nanostructures by High Power Impulse Magnetron Sputtering

Kubart, Tomas; Jablonka, Lukas; Zhang, Zhen; Zhang, Shi-Li

Part of 4 th Magnetron, Ion processing & Arc Technologies European Conference, Paris, 8-11 December 2015, 2015.

Low-temperature synthesis of thermochromic vanadium dioxide thin films using reactive magnetron sputtering

Aijaz, Asim; Ji, Yu-Xia; Granqvist, Claes G; Niklasson, Gunnar A et al.

Part of Abstracts, 2015.

Applying "the upgraded Berg model" to predict hysteresis free reactive sputtering

Särhammar, Erik; Nyberg, Tomas; Berg, Sören

Part of Surface & Coatings Technology, p. 39-43, 2015.

DOI for Applying "the upgraded Berg model" to predict hysteresis free reactive sputtering

Deposition of highly textured AlN thin films by reactive high power impulse magnetron sputtering

Moreira, Milena A.; Törndahl, Tobias; Katardjiev, Ilia; Kubart, Tomas

Part of Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, 2015.

DOI for Deposition of highly textured AlN thin films by reactive high power impulse magnetron sputtering

Microstructural evolution of Au/TiO2 nanocomposite films: The influence of Au concentration and thermal annealing

Borges, J.; Kubart, Tomas; Kumar, S.; Leifer, Klaus et al.

Part of Thin Solid Films, p. 77-88, 2015.

DOI for Microstructural evolution of Au/TiO2 nanocomposite films: The influence of Au concentration and thermal annealing

Large-area homogeneous periodic surface structures generated on the surface sputtered boron carbide thin films by femtosecond laser processing

Serra, R.; Oliveira, V.; Oliveira, J. C.; Kubart, Tomas et al.

Part of Applied Surface Science, p. 161-169, 2015.

DOI for Large-area homogeneous periodic surface structures generated on the surface sputtered boron carbide thin films by femtosecond laser processing

Reactively sputtered films in the CuxS–ZnS–SnSy system: From metastability to equilibrium

Ren, Yi; Scragg, Jonathan J.; Ericson, Tove; Kubart, Tomas et al.

Part of Thin Solid Films, p. 208-214, 2015.

DOI for Reactively sputtered films in the CuxS–ZnS–SnSy system: From metastability to equilibrium

Reactively sputtered films in the CuxS–ZnS–SnSy system: From metastability to equilibrium

Ren, Yi; Scragg, Jonathan; Ericson, Tove; Kubart, Tomas et al.

2014.

Deposition of thermochromic vanadium dioxide thin films by reactive high power impulse magnetron sputtering

Aijaz, Asim; Ji, Yu-Xia; Montero, Jose; Granqvist, Claes-Göran et al.

2014.

Low temperature electronic transport in sputter deposited a-IGZO films

Martin, Nicolas; Nyberg, Tomas; Kapaklis, Vassilios

Part of Current applied physics, p. 1481-1485, 2014.

DOI for Low temperature electronic transport in sputter deposited a-IGZO films

Dynamics of the sputtering target surface evolution in reactive HiPIMS

Kubart, Tomas; Depla, Diederik

Part of Invited talk, 14th International Conference on Plasma Surface Engineering, September 15 - 19, 2014, Garmisch-Partenkirchen, Germany, 2014.

Thin AlN films deposited by reactive HiPIMS and pulsed DC sputtering – a comparative study

Kubart, Tomas; Moreira, Milena; Katardjiev, Ilia

Part of 14th International Conference on Plasma Surface Engineering, September 15 - 19, 2014, Garmisch-Partenkirchen, Germany, 2014.

Reactive HiPIMS of Oxides: Hysteresis and Discharge behaviour

Kubart, Tomas; Helmersson, Ulf; Lundin, Daniel

Part of Invited talk, 42th International Conference on Metallurgical Coatings and Thin Films, San Diego, CA, April 28 -May 2, 2014, 2014.

Measurement of Ionized Metal Flux Fraction in HiPIMS by Retarding Field QCM Analyzer

Kubart, Tomas; Cada, Martin; Hubicka, Zdenek

Part of 41st International Conference on Metallurgical Coatings and Thin Films, San Diego, CA, April 28 - May 2, 2014, 2014.

Tribochemical formation of sulphide tribofilms from a Ti-C-S coating sliding against different counter surfaces

Nyberg, Harald; Sundberg, Jill; Särhammar, Erik; Nyberg, Tomas et al.

Part of Tribology letters, p. 563-572, 2014.

DOI for Tribochemical formation of sulphide tribofilms from a Ti-C-S coating sliding against different counter surfaces

Infiltration of Spiro-MeOTAD hole transporting material into nanotubular TiO2 electrode for solid-state dye-sensitized solar cells

Kuzmych, Oleksandr; Johansson, Erik M. J.; Nonomura, Kazuteru; Nyberg, Tomas et al.

Part of Materials Science & Engineering, p. 67-74, 2014.

DOI for Infiltration of Spiro-MeOTAD hole transporting material into nanotubular TiO2 electrode for solid-state dye-sensitized solar cells

Influence of composition, structure and testing atmosphere on the tribological performance of W-S-N coatings

Sundberg, Jill; Nyberg, Harald; Särhammar, Erik; Nyberg, Tomas et al.

Part of Surface & Coatings Technology, p. 86-94, 2014.

DOI for Influence of composition, structure and testing atmosphere on the tribological performance of W-S-N coatings Download full text (pdf) of Influence of composition, structure and testing atmosphere on the tribological performance of W-S-N coatings

Increasing the carbon deposition rate using sputter yield amplification upon serial magnetron co-sputtering

Schmidt, Ruediger M.; Ries, Patrick; Pflug, Andreas; Wuttig, Matthias et al.

Part of Surface & Coatings Technology, p. 74-78, 2014.

DOI for Increasing the carbon deposition rate using sputter yield amplification upon serial magnetron co-sputtering

Mechanisms for compositional variations of coatings sputtered from a WS2 target

Särhammar, Erik; Strandberg, Erik; Sundberg, Jill; Nyberg, Harald et al.

Part of Surface & Coatings Technology, p. 186-190, 2014.

DOI for Mechanisms for compositional variations of coatings sputtered from a WS2 target

Hysteresis-free high rate reactive sputtering of niobium oxide, tantalumoxide, and aluminum oxide

Särhammar, Erik; Berg, Sören; Nyberg, Tomas

Part of Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, p. 041517-, 2014.

DOI for Hysteresis-free high rate reactive sputtering of niobium oxide, tantalumoxide, and aluminum oxide

Upgrading the “Berg-model” for reactive sputtering processes

Berg, Sören; Särhammar, Erik; Nyberg, Tomas

Part of Thin Solid Films, p. 186-192, 2014.

DOI for Upgrading the “Berg-model” for reactive sputtering processes

Optical properties and refractive index sensitivity of reactive sputtered oxide coatings with embedded Au clusters

Figueiredo, Nuno M.; Kubart, Tomas; Sanchez-Garcia, J. A.; Escobar Galindo, R. et al.

Part of Journal of Applied Physics, p. 063512-, 2014.

DOI for Optical properties and refractive index sensitivity of reactive sputtered oxide coatings with embedded Au clusters

Reactive sputtering of Cu2ZnSnS4 thin films - Target effects on the deposition process stability

Kubart, Tomas; Ericson, Tove; Scragg, Jonathan J.; Edoff, Marika et al.

Part of Surface & Coatings Technology, p. 281-285, 2014.

DOI for Reactive sputtering of Cu2ZnSnS4 thin films - Target effects on the deposition process stability

Investigation of ionized metal flux fraction in HiPIMS discharges with Ti and Ni targets

Kubart, Tomas; Cada, Martin; Lundin, Daniel; Hubicka, Zdenek

Part of Surface & Coatings Technology, p. 152-157, 2014.

DOI for Investigation of ionized metal flux fraction in HiPIMS discharges with Ti and Ni targets

Sputter Rate Distribution and Compositional Variations in Films Sputtered from Elemental and Multi-Element Targets at Different Pressures

Särhammar, Erik; Strandberg, Erik; Martin, Nicolas; Nyberg, Tomas

Part of International Journal of Materials Science and Applications, p. 29-36, 2014.

DOI for Sputter Rate Distribution and Compositional Variations in Films Sputtered from Elemental and Multi-Element Targets at Different Pressures

Flexible Thin-Flm Transistors on Planarized Parylene Substrate with Recessed Individual Backgates

Farkas, Balazs; Nyberg, Tomas; Nanai, Laszlo

Part of Solid-State Electronics, p. 11-14, 2014.

DOI for Flexible Thin-Flm Transistors on Planarized Parylene Substrate with Recessed Individual Backgates

Phase formation and morphological stability of ultrathin Ni-Co-Pt silicide films formed onSi(100)

Xu, Peng; Kubart, Tomas; Gao, Xindong; Wu, Dongping et al.

Part of Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, p. 031503-, 2014.

DOI for Phase formation and morphological stability of ultrathin Ni-Co-Pt silicide films formed onSi(100)

Extreme friction reductions during inital running-in of W-S-C-Ti low-friction coatings

Nyberg, Harald; Sundberg, Jill; Särhammar, Erik; Gustavsson, Fredrik et al.

Part of 19th International Conference on Wear of Materials 2013; 14-18 April 2013; Portland, OR, USA, 2013.

HiPIMS deposition of TiOx in an industrial-scale apparatus: Effects of target size and deposition geometry on hysteresis

Surpi, Alessandro; Kubart, Tomas; Giordani, Diego; Tosello, Martino et al.

Part of Surface & Coatings Technology, p. 714-719, 2013.

DOI for HiPIMS deposition of TiOx in an industrial-scale apparatus: Effects of target size and deposition geometry on hysteresis

A study of the process pressure influence in reactive sputtering aiming at hysteresis elimination

Särhammar, Erik; Strijckmans, K.; Nyberg, Tomas; Van Steenberge, S. et al.

Part of Surface & Coatings Technology, p. 357-361, 2013.

DOI for A study of the process pressure influence in reactive sputtering aiming at hysteresis elimination

Deposition of hematite Fe2O3 thin film by DC pulsed magnetron and DC pulsed hollow cathode sputtering system

Hubicka, Z.; Kment, S.; Olejnicek, J.; Cada, M. et al.

Part of Thin Solid Films, p. 184-191, 2013.

DOI for Deposition of hematite Fe2O3 thin film by DC pulsed magnetron and DC pulsed hollow cathode sputtering system

Investigation of ionized metal flux fraction in HiPIMS discharge with Ti and Ni target

Kubart, Tomas; Cada, Martin; Lundin, Daniel; Hubicka, Zdenek

2013.

Unique UV-Erasable In-Ga-Zn-O TFT Memory With Self-Assembled Pt Nanocrystals

Cui, Xing-Mei; Chen, Sun; Ding, Shi-Jin; Sun, Qing-Qing et al.

Part of IEEE Electron Device Letters, p. 1011-1013, 2013.

DOI for Unique UV-Erasable In-Ga-Zn-O TFT Memory With Self-Assembled Pt Nanocrystals

Novel Zn-Doped Al2O3 Charge Storage Medium for Light-Erasable In-Ga-Zn-O TFT Memory

Chen, S.; Cui, X-M; Ding, S-J; Sun, Q-Q et al.

Part of IEEE Electron Device Letters, p. 1008-1010, 2013.

DOI for Novel Zn-Doped Al2O3 Charge Storage Medium for Light-Erasable In-Ga-Zn-O TFT Memory

Effects of Back Contact Instability on Cu₂ZnSnS₄ Devices and Processes

Scragg, Jonathan J.; Kubart, Tomas; Wätjen, Timo; Ericson, Tove et al.

Part of Chemistry of Materials, p. 3162-3171, 2013.

DOI for Effects of Back Contact Instability on Cu₂ZnSnS₄ Devices and Processes Download full text (pdf) of Effects of Back Contact Instability on Cu₂ZnSnS₄ Devices and Processes

Anisotropic electrical resistivity during annealing of oriented columnar titanium films

Martin, Nicolas; Sauget, Jeremie; Nyberg, Tomas

Part of Materials letters (General ed.), p. 20-23, 2013.

DOI for Anisotropic electrical resistivity during annealing of oriented columnar titanium films

Reactive magnetron sputtering: from fundamentals to high deposition rate processes

Kubart, Tomas

Part of Proceedings of the Twelfth th International Symposium on Sputtering & Plasma Processes ISSP 2013, p. 5-9, 2013.

Download full text (pdf) of Reactive magnetron sputtering: from fundamentals to high deposition rate processes

The interdependence of structural and electrical properties in TiO2/TiO/Ti periodic multilayers

Cacucci, Arnaud; Tsiaoussis, Ioannis; Potin, Valerie; Imhoff, Luc et al.

Part of Acta Materialia, p. 4215-4225, 2013.

DOI for The interdependence of structural and electrical properties in TiO2/TiO/Ti periodic multilayers

Tribochemically Active Ti–C–S Nanocomposite Coatings

Sundberg, Jill; Nyberg, Harald; Särhammar, Erik; Kádas, Krisztina et al.

Part of Materials Research Letters, p. 148-155, 2013.

DOI for Tribochemically Active Ti–C–S Nanocomposite Coatings Download full text (pdf) of Tribochemically Active Ti–C–S Nanocomposite Coatings

Influence of Ti addition on the structure and properties of low-friction W–S–C coatings

Sundberg, Jill; Nyberg, Harald; Särhammar, Erik; Gustavsson, Fredrik et al.

Part of Surface & Coatings Technology, p. 340-348, 2013.

DOI for Influence of Ti addition on the structure and properties of low-friction W–S–C coatings

Tribochemically active Ti-C-S nanocomposites – a new concept for self-lubricating coatings

Sundberg, Jill; Nyberg, Harald; Särhammar, Erik; Kádas, Krisztina et al.

2013.

Tribochemically active Ti-C-S coatings

Sundberg, Jill; Nyberg, Harald; Särhammar, Erik; Nyberg, Tomas et al.

2013.

Understanding the discharge current behavior in reactive high power impulse magnetron sputtering of oxides

Aiempanakit, Montri; Aijaz, Asim; Lundin, Daniel; Helmersson, Ulf et al.

Part of Journal of Applied Physics, p. 133302-, 2013.

DOI for Understanding the discharge current behavior in reactive high power impulse magnetron sputtering of oxides

Extreme friction reductions during inital running-in of W-S-C-Ti low-friction coatings

Nyberg, Harald; Sundberg, Jill; Särhammar, Erik; Gustavsson, Fredrik et al.

Part of Wear, p. 987-997, 2013.

DOI for Extreme friction reductions during inital running-in of W-S-C-Ti low-friction coatings

Annealing behavior of reactively sputtered precursor films for Cu₂ZnSnS₄ solar cells

Ericson, Tove; Scragg, Jonathan J.; Kubart, Tomas; Törndahl, Tobias et al.

Part of Thin Solid Films, p. 22-26, 2013.

DOI for Annealing behavior of reactively sputtered precursor films for Cu₂ZnSnS₄ solar cells Download full text (pdf) of Annealing behavior of reactively sputtered precursor films for Cu₂ZnSnS₄ solar cells

Rapid annealing of reactively sputtered precursors for Cu2ZnSnS4 solar cells

Scragg, Jonathan; Ericson, Tove; Fontané, Xavier; Izquierdo-Roca, Victor et al.

Part of Progress in Photovoltaics, p. 10-17, 2013.

DOI for Rapid annealing of reactively sputtered precursors for Cu2ZnSnS4 solar cells

Understanding the discharge current behavior in reactive high power impulse magnetron sputtering of oxides

Aiempanakit, M; Aijaz, A; Lundin, D; Helmersson, U et al.

p. 9- 2012.

High rate reactive magnetron sputtering of oxides using sputtering yield amplification

Kubart, Tomas; Nyberg, Tomas; Berg, Sören

2012.

Reactive sputtering of Fe₂O₃ thin films by high power pulsed plasma systems

Hubicka, Zdenek; Cada, Martin; Kmet, Stepan; Olejnicek, Jiri et al.

2012.

Reactive magnetron sputtering of precursors for CZTS solar cells

Kubart, Tomas; Ericson, Tove; Scragg, Jonathan; Platzer-Björkman, Charlotte

2012.

HiPIMS deposition of TiO_x in an industrial-scale apparatus: effects of target size and deposition geometry on hysteresis

Patelli, Alessandro; Colasuonno, Mario; Tosello, Martino; Giordani, Diego et al.

2012.

Modelling of reactive magnetron sputtering: Towards comprehensive model

Kubart, Tomas

2012.

Defect minimization and morphology optimization in TiO2 nanotube thin films, grown on transparent conducting substrate, for dye synthesized solar cell application

Kuzmych, Oleksandr; Nonomura, Kazuteru; Johansson, Erik M. J.; Nyberg, Tomas et al.

Part of Thin Solid Films, p. 71-78, 2012.

DOI for Defect minimization and morphology optimization in TiO2 nanotube thin films, grown on transparent conducting substrate, for dye synthesized solar cell application

A Detrimental Reaction at the Molybdenum Back Contact in Cu₂ZnSn(S,Se)₄ Thin-Film Solar Cells

Scragg, Jonathan; Wätjen, Timo; Edoff, Marika; Ericson, Tove et al.

Part of Journal of the American Chemical Society, p. 19330-19333, 2012.

DOI for A Detrimental Reaction at the Molybdenum Back Contact in Cu₂ZnSn(S,Se)₄ Thin-Film Solar Cells

Reactive sputtering of precursors for Cu2ZnSnS4 thin film solar cells

Ericson, Tove; Kubart, Tomas; Scragg, Jonathan J.; Platzer-Björkman, Charlotte

Part of Thin Solid Films, p. 7093-7099, 2012.

DOI for Reactive sputtering of precursors for Cu2ZnSnS4 thin film solar cells Download full text (pdf) of Reactive sputtering of precursors for Cu2ZnSnS4 thin film solar cells

Mechanisms responsible for compositional variations of films sputtered from a WS2 target

Särhammar, Erik; Sundberg, Jill; Nyberg, Harald; Kubart, Tomas et al.

Part of International Conference on Metallurgical Coatings and Thin films (ICMCTF) 23-27/04 2012, San Diego, abstract number:428, 2012.

Sulfur-doping of nc-TiC/a-C films by reactive sputtering

Sundberg, Jill; Nyberg, Harald; Särhammar, Erik; Nyberg, Tomas et al.

Part of Thirteenth International Conference on Plasma Surface Engineering, Garmisch-Partenkirchen, Germany, 10-14 September 2012, 2012.

Modelling of sputtering yield amplification in serial reactive magnetron co-sputtering

Kubart, Tomas; Schmidt, R. M.; Austgen, M.; Nyberg, Tomas et al.

Part of Surface & Coatings Technology, p. 5055-5059, 2012.

DOI for Modelling of sputtering yield amplification in serial reactive magnetron co-sputtering

Conformal Ni-silicide formation over three-dimensional device structures

Zhu, Zhiwei; Gao, Xindong; Kubart, Tomas; Zhang, Zhi-Bin et al.

Part of Applied Physics Letters, p. 053508-, 2012.

DOI for Conformal Ni-silicide formation over three-dimensional device structures

Influence of precursor sulfur content on film formation and compositional changes in Cu2ZnSnS4 films and solar cells

Platzer-Björkman, Charlotte; Scragg, Jonathan; Flammersberger, H; Kubart, Tomas et al.

Part of Solar Energy Materials and Solar Cells, p. 110-117, 2012.

DOI for Influence of precursor sulfur content on film formation and compositional changes in Cu2ZnSnS4 films and solar cells

Epitaxy of Ultrathin NiSi2 Films with Predetermined Thickness

Gao, Xindong; Andersson, Joakim; Kubart, Tomas; Nyberg, Tomas et al.

Part of Electrochemical and solid-state letters, p. H268-H270, 2011.

Synthesis of c-tilted AlN films with a good tilt and thickness uniformity

Moreira, Milena; Bjurström, Johan; Kubart, Tomas; Kuzavas, Björn et al.

Part of Proceedings of IEEE INTERNATIONAL ULTRASONICS SYMPOSIUM, p. 1238-1241, 2011.

Quaternary W-S-C-Ti films for tribological applications

Sundberg, Jill; Särhammar, Erik; Nyberg, Harald; Kubart, Tomas et al.

2011.

Synthesis and characterization of (0001)-textured wurtzite Al(1-x)B(x)N thin films

Liljeholm, Lina; Junaid, M.; Kubart, Tomas; Birch, J. et al.

Part of Surface & Coatings Technology, p. 1033-1036, 2011.

DOI for Synthesis and characterization of (0001)-textured wurtzite Al(1-x)B(x)N thin films

Sputter Yield Amplification of reactively sputtered TiO₂

Schmidt, Rüdiger; Kubart, Tomas; Austgen, Michael; Wagner, D et al.

2011.

Hysteresis effect in reactive high power impulse magnetron sputtering of metal oxides

Aiempanakit, Montri; Aijaz, Asim; Helmersson, Ulf; Kubart, Tomas

2011.

Chemical Insights into the Instability of Cu(2)ZnSnS(4) Films during Annealing

Scragg, Jonathan J.; Ericson, Tove; Kubart, Tomas; Edoff, Marika et al.

Part of Chemistry of Materials, p. 4625-4633, 2011.

DOI for Chemical Insights into the Instability of Cu(2)ZnSnS(4) Films during Annealing

Hysteresis and process stability in reactive high power impulse magnetron sputtering of metal oxides

Aiempanakit, Montri; Kubart, Tomas; Larsson, Petter; Sarakinos, Kostas et al.

Part of Thin Solid Films, p. 7779-7784, 2011.

DOI for Hysteresis and process stability in reactive high power impulse magnetron sputtering of metal oxides

Sputter yield amplification by tungsten doping of Al(2)O(3) employing reactive serial co-sputtering: process characteristics and resulting film properties

Austgen, M; Koehl, D; Zalden, P; Kubart, Tomas et al.

Part of Journal of Physics D, p. 345501-, 2011.

DOI for Sputter yield amplification by tungsten doping of Al(2)O(3) employing reactive serial co-sputtering: process characteristics and resulting film properties

Studies of hysteresis effect in reactive HiPIMS deposition of oxides

Kubart, Tomas; Aiempanakit, M; Andersson, Joakim; Nyberg, Tomas et al.

Part of Surface & Coatings Technology, p. S303-S306, 2011.

DOI for Studies of hysteresis effect in reactive HiPIMS deposition of oxides

Implantation and surface modification of TiO2 by a Focused Ion Beam

Jensen, Jens; Surpi, Alessandro; Kubart, Tomas; Hultman, Lars

Part of E-MRS 2011 Spring Meeting, 2011.

Serial magnetron co-sputtering: Sputtering yield amplification and process modelling

Kubart, Tomas; Nyberg, Tomas; Berg, Soren; Austgen, Michael et al.

Part of E-MRS 2011 Spring Meeting, 2011.

Ion irradiation-induced modification of TiO2 thin films

Jensen, Jens; Aiempanakit, Montri; Kubart, Tomas

Part of E-MRS 2011 Spring Meeting, 2011.

Nanocomposite coatings consisting of noble metal nanoclusters embedded into a dielectric matrix by reactive HIPIMS

Figueiredo, Nuno; Oliveira, Joao; Kubart, Tomas; Cavaleiro, Albano

Part of 2nd International Conference on Fundamentals and Applications of HIPIMS, June 2011, Braunschweig, 2011.

Modelling of target effects in reactive HIPIMS

Kubart, Tomas; Andersson, Joakim

Part of 2nd Internation Conference on Fundamentals and Applications of HIPIMS, June 2011, Braunschweig, 2011.

Effect of peak power in reactive high power impulse magnetron sputtering of titanium dioxide

Aiempanakit, Montri; Helmersson, Ulf; Aijaz, Asim; Larsson, Petter et al.

Part of Surface & Coatings Technology, p. 4828-4831, 2011.

DOI for Effect of peak power in reactive high power impulse magnetron sputtering of titanium dioxide

Process modelling for reactive magnetron sputtering

Kubart, Tomas

Part of Potential and Applications of Thin Ceramic and Metal Coatings 2011. 2nd PATCMC, 6th - 8th June, 2011 Plzeň, Czech Republic, p. 25-28, 2011.

Download full text (pdf) of Process modelling for reactive magnetron sputtering

Epitaxy of Ultrathin NiSi2 Films with Predetermined Thickness

Gao, Xindong; Andersson, Joakim; Kubart, Tomas; Nyberg, Tomas et al.

Part of Electrochemical and solid-state letters, p. H268-H270, 2011.

DOI for Epitaxy of Ultrathin NiSi2 Films with Predetermined Thickness

Sputtering Yield Amplification in Reactive Serial Co-Sputtering

Kubart, Tomas; Nyberg, Tomas; Berg, Sören; Pflug, A. et al.

2010.

The influence of total processing pressure on the hysteresis behaviour in reactive sputtering

Särhammar, Erik; Nyberg, Tomas; Berg, Sören

2010.

Sputtering yield amplification in reactive sputtering

Berg, Sören; Nyberg, Tomas; Kubart, Tomas

2010.

Studies of hysteresis effect in reactive HiPIMS deposition of oxides

Kubart, Tomas; Aiempanakit, M.; Andersson, J.; Nyberg, Tomas et al.

2010.

Studies of TiN films deposited by HIPIMS at different substrate temperatures and substrate bias

Hallman, R.; Andersson, J.; Särhammar, Erik; Nyberg, Tomas et al.

2010.

Molecular dynamics simulations of low energy Ar sputtering of TiO2 surfaces

Kubart, Tomas; Arapan, Sergiu; Skorodumova, Natalia V.; Nyberg, Tomas et al.

2010.

Localised modifications of anatase TiO2 thin films by a Focused Ion Beam

Surpi, Alessandro; Göthelid, Emmanuelle; Kubart, Tomas; Martin, David et al.

Part of Nuclear Instruments and Methods in Physics Research Section B, p. 3142-3146, 2010.

DOI for Localised modifications of anatase TiO2 thin films by a Focused Ion Beam

Reactive sputtering of SiO₂–TiO₂ thin film from composite Si_x/TiO₂ targets

Liljeholm, Lina; Nyberg, Tomas; Kubart, Tomas; Roos, Arne et al.

Part of Vacuum, p. 317-321, 2010.

DOI for Reactive sputtering of SiO₂–TiO₂ thin film from composite Si_x/TiO₂ targets

Modelling of sputtering yield amplification effect in reactive deposition of oxides

Kubart, Tomas; Nyberg, Tomas; Pflug, A.; Siemers, M. et al.

Part of Surface & Coatings Technology, p. 3882-3886, 2010.

DOI for Modelling of sputtering yield amplification effect in reactive deposition of oxides

ERD analysis and modification of TiO2 thin films with heavy ions

Jensen, Jens; Martin, David; Surpi, Alessandro; Kubart, Tomas

Part of Nuclear Instruments and Methods in Physics Research Section B, p. 1893-1898, 2010.

DOI for ERD analysis and modification of TiO2 thin films with heavy ions

Modelling of low energy ion sputtering from oxide surfaces

Kubart, Tomas; Nyberg, Tomas; Berg, Sören

Part of Journal of Physics D, p. 205204-, 2010.

DOI for Modelling of low energy ion sputtering from oxide surfaces

Preferential Sputtering of Oxides and Target Design for Stable Reactive Magnetron Deposition of Oxides

Kubart, Tomas; Nyberg, Tomas; Berg, Sören

2009.

Studies and Modelling of Surface Modifications of Different Oxides During Ion Bombardmen

Nyberg, Tomas; Kubart, Tomas; Berg, Sören

Part of Presented at the 7th Asian-European  International Conference on Plasma Surface Engineering (AEPSE 2009), Busan, South Korea,  September 20-25, 2009, 2009.

Stable High Rate Reactive Sputter Deposition of Aluminium Oxide from Segmented Targets of Aluminium and Aluminium Oxide

Särhammar, Erik; Nyberg, Tomas; Kubart, Tomas; Berg, Sören

Part of Presented at the International Symposium on Reactive Sputter Deposition (RSD2009),  Manchester, United Kingdom, December 10-11, 2009, 2009.

Decorative Oxide Coatings: Colour Control by Compositional Gradient

Kubart, Tomas; Nyberg, Tomas; Polcar, T; Cavaleiro, A et al.

Part of E-MRS 2009, Spring Meeting in Strasbourgh, France, June 8-12, 2009, 2009.

Increase of the Deposition Rate in Reactive Sputtering of Metal Oxides using a Ceramic Nitride Target

Severin, D; Kappertz, Oliver; Nyberg, Tomas; Berg, Sören et al.

Part of Journal of Applied Physics, p. 093302-, 2009.

DOI for Increase of the Deposition Rate in Reactive Sputtering of Metal Oxides using a Ceramic Nitride Target

Implantation of anatase thin film with 100 keV ⁵⁶Fe ions: Damage formation and magnetic behaviour

Jensen, J.; Sanz, R.; Martin, David; Surpi, Alessandro et al.

Part of Nuclear Instruments and Methods in Physics Research Section B, p. 2725-2730, 2009.

DOI for Implantation of anatase thin film with 100 keV ⁵⁶Fe ions: Damage formation and magnetic behaviour

Influence of the target composition on reactively sputtered titanium oxide films

Kubart, Tomas; Jensen, Jens; Nyberg, Tomas; Liljeholm, Lina et al.

Part of Vacuum, p. 1295-1298, 2009.

DOI for Influence of the target composition on reactively sputtered titanium oxide films

Reactively sputtered ZrN for application as reflecting back contact in Cu(In,Ga)Se-2 solar cells

Schleussner, Sebastian; Kubart, Tomas; Törndahl, Tobias; Edoff, Marika

Part of Thin Solid Films, p. 5548-5552, 2009.

DOI for Reactively sputtered ZrN for application as reflecting back contact in Cu(In,Ga)Se-2 solar cells Download full text (pdf) of Reactively sputtered ZrN for application as reflecting back contact in Cu(In,Ga)Se-2 solar cells

Damage formation in TiO2 by heavy ions: consequences for micro- and nano-struring

Jensen, Jens; Kubart, Tomas; Martin, David; Surpi, A et al.

Part of 7th International Symposium on Swift Heavy Ions in Matter (SHIM2008), 2008.

Magnetic behaviour of Fe implanted TiO2 thin films

Sanz, R; Hernández-Vélez, M; Kubart, Tomas; Martin, David et al.

Part of Book of Abstracts, 2008.

Experiments and modeling of dual reactive magnetron sputtering using two reactive gases

Kubart, Tomas; Trinh, D. H.; Liljeholm, L.; Hultman, L. et al.

Part of Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, p. 565-570, 2008.

DOI for Experiments and modeling of dual reactive magnetron sputtering using two reactive gases

Direct current magnetron sputtering deposition of nanocomposite alumina – zirconia thin films

Trinh, D H; Kubart, Tomas; Nyberg, Tomas; Ottosson, M et al.

Part of Thin Solid Films, p. 8352-8358, 2008.

DOI for Direct current magnetron sputtering deposition of nanocomposite alumina – zirconia thin films

Nanoscale colour control: W-O graded coatings deposited by magnetron sputtering

Polcar, Tomas; Kubart, Tomas; Malainho, Eva; Vasilevskiy, Mikhail et al.

Part of Nanotechnology, p. 395202-, 2008.

DOI for Nanoscale colour control: W-O graded coatings deposited by magnetron sputtering

A model of DC reactive magnetron sputtering for graded solar thermal absorbers

Kubart, Tomas; Zhao, Shuxi; Wingqvist, Gunilla; Nyberg, Tomas et al.

Part of Journal of Physics, Conference Series, p. 082024-, 2008.

DOI for A model of DC reactive magnetron sputtering for graded solar thermal absorbers

High rate reactive magnetron sputter deposition of titanium oxide

Kubart, Tomas; Depla, Diederik; Martin, David; Nyberg, Tomas et al.

Part of Applied Physics Letters, p. 221501-, 2008.

DOI for High rate reactive magnetron sputter deposition of titanium oxide

Modelling of Magnetron Sputtering of Tungsten Oxide with Reactive Gas Pulsing

Kubart, Tomas; Polcar, Tomas; Kappertz, Oliver; Parreira, Nuno et al.

Part of Plasma Processes and Polymers, p. S522-S526, 2007.

DOI for Modelling of Magnetron Sputtering of Tungsten Oxide with Reactive Gas Pulsing

Experiments and modelling of reactive sputtering using two reactive gases and two targets

Kubart, Tomas; Trinh, D H; Liljeholm, Lina; Hultman, Lars et al.

2007.

A model of DC reactive magnetron sputtering for graded solar thermal absorbers

Kubart, Tomas; Zhao, Shuxi; Nyberg, Tomas; Berg, Sören et al.

2007.

On the high rate reactive sputtering of substoichiometric titanium oxide targets

Kubart, Tomas; Depla, D; Martin, David; Nyberg, Tomas et al.

2007.

The Effect of Target Aging on the Structure Formation of Zinc Oxide During Reactive Sputtering

Severin, Daniel; Kappertz, Oliver; Nyberg, Tomas; Berg, Sören et al.

Part of Thin Solid Films, p. 3554-3558, 2007.

DOI for The Effect of Target Aging on the Structure Formation of Zinc Oxide During Reactive Sputtering

Advanced Process Modelling of the Rotating Magnetron

Kappertz, Oliver; Kubart, Tomas; Nyberg, Tomas; Berg, Sören

2006.

Modelling of Magnetron Sputtering of Tungsten Oxide with Reactive Gas Pulsing

Rosén, Daniel; Kubart, Tomas; Kappertz, Oliver; Nyberg, Tomas et al.

2006.

Dynamic Modelling of Reactive Magnetron Sputtering

Kubart, Tomas; Kappertz, Oliver; Nyberg, Tomas; Berg, Sören

2006.

State of the art in Reactive Magnetron Sputtering

Nyberg, Tomas; Kappertz, Oliver; Kubart, Tomas; Berg, Sören et al.

Part of Invited to The third Mikkeli International Industrial Coating Seminar, MIICS 2006, Mikkeli, Finland, March 16-18, 2006 and Conference Proceedings, 2006.

Process Stabilization and Increase of the Deposition Rate in Reactive Sputtering of Metal Oxides and Oxynitrides

Severin, D; Kappertz, Oliver; Kubart, Tomas; Nyberg, Tomas et al.

Part of Appl Phys Lett, 2006.

Dynamic behaviour of the reactive sputtering process

Kubart, Tomas; Kappertz, Oliver; Nyberg, Tomas; Berg, Sören

Part of Thin Solid Films, p. 421-424, 2006.

Modelling of the Plasma Impedance in Reactive Magnetron Sputtering for Various Traget Materials

Pflug, Andreas; Siemers, M; Szyszka, B; Kappertz, Oliver et al.

Part of Proceedings of the 48th Annual Society of Vacuum Coaters Technical Conference in Denver, April 23-28, p. 298-301, 2005.

Modelling of Sputter Erosion Rate Enchancement from Ceramic Targets

Nyberg, Tomas; Kappertz, Oliver; Rosén, Daniel; Kubart, Tomas et al.

Part of Proc of the 48th Annual Society of Vacuum Coaters Technical Conference in Denver, USA, p. 298-301, 2005.

Dynamic Behaviour of the Reactive Sputtering Process

Kubart, Tomas; Kappertz, Oliver; Nyberg, Tomas; Berg, Sören

Part of Presented at 13th International Congress on Thin Films 8th International Conference on Atomically Controlled Surfaces, Interfaces & Nanostructures (ICTF13/ACSIN8) in Stockholm, Sweden, 19-23 June 2005, 2005.

Kinetic behaviour of target poisoning during reactive sputtering

Rosén, Daniel; Kubart, Tomas; Kappertz, Oliver; Nyberg, Tomas et al.

Part of Reactive Sputter Deposition 2005 in Delft, The Netherlands, 2005.

Ionenimplantation beim reaktiven Sputtern

Severin, Daniel; Wuttig, M; Kappertz, Oliver; Nyberg, Tomas et al.

Part of Presented at the 69. Annual Meeting of the Deutsche Physikalische Gesellschaft in Berlin, March, 2005.

Ion Implantation Effects in Reactive Sputter Deposition

Kappertz, Oliver; Kubart, Tomas; Nyberg, Tomas; Berg, Sören et al.

Part of Presented at the 14th Int. Conf. on Surface Modification of Materials by Ion Beams (SMMIB’05) in Kusadasi, Turkey, 4-9 September, 2005.

Reactive Sputtering – Experiments and Modelling

Nyberg, Tomas; Berg, Sören

Part of Invited to Sweden-China Symposium on Materials Science in Beijing, China, 10-13 May, 2005.

Experimental Studies of the Dynamic Behavior of the Reactive Sputtering Process

Kubart, Tomas; Kappertz, Oliver; Nyberg, Tomas; Berg, Sören

Part of Presented at the 5th Asian-European Int. Conf. on Plasma Surface Engineering (AEPSE 2005) in Qingdao City, China, 12-16 September, 2005.

Eliminating the hysteresis effect for reactive sputtering processes

Nyberg, Tomas; Berg, Sören

Part of Appl Phys Lett, 2005.

Fundamental understanding and modeling of reactive sputtering process

Berg, Sören; Nyberg, Tomas

Part of Thin Solid Films, p. 215-230, 2005.

Advances in Heuristic and Monte-Carlo Simulation of Reactive Sputtering and Technical Application

Pflug, Andreas; Sittinger, V; Scyszka, B; Nyberg, Tomas et al.

Part of Invited to the Symposium on Reactive Sputter Processes and Related Phenomena III, Ghent, Belgium, December 9-10, 2004.

A Simplified Treatment of Target Implantation Effects in Reactive Sputtering

Kappertz, Oliver; Nyberg, Tomas; Rosén, Daniel; Katardjiev, Ilia et al.

Part of The International Conference on Metallurgical Coatings and Thin Films in San Diego, USA, 2004.

Modelling of Sputter Erosion Rate Enhancement from Ceramic Targets

Nyberg, Tomas; Kappertz, Oliver; Rosén, Daniel; Kubart, Tomas et al.

Part of Proceedings of Society of Vacuum Coaters, p. 324.328-, 2004.

Deposition of Ti2AIC and Ti3AIC2 epitaxial films by magnetron sputtering

Wilhelmsson, Ola; Palmquist, Jens-Petter; Nyberg, Tomas; Jansson, Ulf

Part of Applied Physics Letters, p. 1066-1067, 2004.

Heuristic model of the plasma impedance in reactive magnetron sputtering

Pflug, A; Szyszka, B; Berg, Sören; Nyberg, Tomas et al.

Part of 5th International Conference on Coatings on Glass, Saarbrücken, Germany, July, 2004.

Influence of rotating magnets on hysteresis in reactive sputtering

Kappertz, Oliver; Nyberg, Tomas; Rosén, Daniel; Berg, Sören

Part of Society of Vacuum Coaters, 7th Annual Technical Conference Proceedings, April, 2004.

Complex Target Poisoning Effects in Reactive Sputtering

Rosén, Daniel; Kappertz, Oliver; Nyberg, Tomas; Katardjiev, Ilia et al.

Part of American Vacuum Society Symposium & Exhibition, Anaheim USA, 2004.

Basic Understanding of Reactive Sputtering Processes

Berg, Sören; Nyberg, Tomas

Part of Invited to the AVS 50th National Symposium in Baltimore, Maryland, USA, November 2-7, 2003, 2003.

Basic Understanding of the Pulsed DC Reactive Spitter Deposition Process

Berg, Sören; Nyberg, Tomas; Katardjiev, Ilia

Part of The 4th Asian-European Int Conf on Plasma Surface Engineering, AEPSE 2003, Jeju City, South Korea, September 28-October 2, 2003, 2003.

Control of reactive sputtering process using two reactive gases

Sproul, W D; Christie, D J; Carter, D C; Berg, Sören et al.

Part of Proc. of the AVS 4th International Conference on Microelectronics & Interfaces, Santa Clara, USA, p. 98-103, 2003.

Stable Reactive Sputtering Processes

Nyberg, Tomas; Berg, Sören

Part of ISSP 2003, The 7th International Symposium on Sputtering & Plasma Processes, June 11-13, Kanazawa, Japan, p. 235-239, 2003.

Stable reactive sputtering using 2 reactive gases

Nyberg, Tomas; Sproul, W D; Carter, K L; Berg, Sören

Part of ICMCTF 2003, The International Conference on Metallurgical Coatings and Thin Films April 28 - May 2, San Diego, USA, 2003.

Experimental and computer simulation studies of the

Engelmark, Fredrik; Westlinder, Jörgen; Nyberg, Tomas; Berg, Sören

Part of J Vac Sci Technol, p. 1981-1987, 2003.

Dynamic simulations of pulsed reactive sputtering processes

Jonsson, Lars; Nyberg, Tomas; Berg, Sören

Part of J Vac Sci Technol, p. 503-508, 2000.

Frequency response in pulsed DC reactive sputtering processes

Jonsson, Lars; Nyberg, Tomas; Katardjiev, Ilia; Berg, Sören

Part of Thin Solid Films, p. 43-48, 2000.

Basic Understanding of the Pulsed DC Reactive Sputter Deposition Process

Berg, Sören; Jonsson, Lars; Nyberg, Tomas; Katardjiev, Ilia

Part of Invited to Second Asian-European Int Conf on Plasma Surface Engineering (AEPSE´99), Beijing, September 15-19, 1999.

Target compound layer formation during reactive sputtering

Jonsson, Lars; Nyberg, Tomas; Berg, Sören

Part of JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, p. 1827-1831, 1999.

Target Compound Layer Formation during Reactive Sputtering

Jonsson, Lars; Nyberg, Tomas; Berg, Sören

Part of Presented at AVS 45th National Symposium in Baltimore, Maryland, USA, November 2-6, 1998.

Modeling of the deposition of stoichiometric Al2O3 using nonarcing direct current magnetron sputtering

Macak, K; Nyberg, Tomas; Macak, P; Olsson, M K et al.

Part of J Vac Sci Technol A, p. 1286-1292, 1998.

Composition control by current modulation in dc-reactive sputtering

Nyberg, Tomas; Nender, Claes; Berg, Sören

Part of JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, p. 1868-1872, 1998.

Computer modeling as a tool to predict deposition rate and film composition in the reactive sputtering process

Berg, Sören; Nyberg, Tomas; Blom, Hans-Olof; Nender, Claes

Part of JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, p. 1277-1285, 1998.

The influence of the deposition angle on the composition of reactively sputtered thin films

Nyberg, Tomas; Nender, Claes; Hogberg, H; Berg, Sören

Part of SURFACE & COATINGS TECHNOLOGY, p. 242-246, 1997.

Diamond deposition from halogenated methane precursors on Si and SiC substrates

Nyberg, Tomas; Heszler, Peter; Carlsson, Jan-Otto

Part of Diamond and Related Materials, p. 85-88, 1997.

Studies of reactive sputtering of multi-phase chromium nitride

Nyberg, Tomas; Skytt, P; Gålnander, Björn; Nender, Claes et al.

Part of JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, p. 248-252, 1997.

Probe depth variation in grazing exit soft-X-ray emission spectroscopy

Skytt, P; Gålander, Björn; Nyberg, Tomas; Nordgren, Joseph et al.

Part of NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, p. 558-562, 1997.

In situ diagnostic studies of reactive co-sputtering from two targets by means of soft x-ray and optical emission spectroscopy

Nyberg, Tomas; Skytt, P; Gålnander, Björn; Nender, Claes et al.

Part of JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, p. 145-148, 1997.

Diamond deposition in a microwave electrode discharge at reduced pressures

Bardos, Ladislav; Barankova, Hana; Lebedev, Y A; Nyberg, Tomas et al.

Part of DIAMOND AND RELATED MATERIALS, p. 224-229, 1997.

Electronic interaction of light, keV ions in transition metal nitrides

Bruckner, Barbara